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High Purity 99.95% Tungsten Sputtering Target Sandblasting

  • High Purity 99.95% Tungsten Sputtering Target Sandblasting
  • High Purity 99.95% Tungsten Sputtering Target Sandblasting
  • High Purity 99.95% Tungsten Sputtering Target Sandblasting
  • High Purity 99.95% Tungsten Sputtering Target Sandblasting
  • High Purity 99.95% Tungsten Sputtering Target Sandblasting
Place of Origin China
Brand Name Hypersolid Metal
Minimum Order Quantity Negotiate
Price Negitionable
Packaging Details Standard export cartons
Delivery Time 30 days after receiving down payment
Payment Terms L/C, D/A, D/P, T/T, Western Union, MoneyGram
Supply Ability 10000sets/month

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Product Details
Atomic Number 74 Atomic Weight 183.84
Boiling Point 5927°C Electronegativity 2.36
Material Tungsten Melting Point 3410°C
Oxidation State 6, 5, 4, 3, 2, 0, -1, -2, -3, -4, -5, -6 Surface Treatment Polishing, Sandblasting, Anodizing, Etc.
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high purity tungsten sputtering target

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Sandblasting tungsten sputtering target

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99.95% tungsten sputtering
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Product Description

1,Description:

Material: Tungsten target materials are typically made from high-purity tungsten or tungsten alloys, specifically designed for use in physical vapor deposition (PVD) processes.

High Melting Point: Tungsten has an exceptionally high melting point of approximately 3,422 degrees Celsius (6,191 degrees Fahrenheit), allowing it to withstand the high temperatures generated during PVD processes.

Density: Tungsten target materials have a high density, typically ranging from 17.8 to 19.3 grams per cubic centimeter (g/cm³), ensuring a high deposition rate and efficient material utilization.

 

2,Specifications:

Material High-purity tungsten or tungsten alloys
Melting Point Approximately 3,422 degrees Celsius (6,191 degrees Fahrenheit)
Density 17.8 - 19.3 grams per cubic centimeter (g/cm³)
Thermal Conductivity Excellent thermal conductivity
Sputtering Rate Relatively low sputtering rate, minimal material loss
Purity High levels of purity, minimal impurities
Uniformity Precise dimensions and uniformity for consistent film deposition

 

High Purity 99.95% Tungsten Sputtering Target Sandblasting 0High Purity 99.95% Tungsten Sputtering Target Sandblasting 1

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high purity tungsten sputtering target

Sandblasting tungsten sputtering target

99.95% tungsten sputtering