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W Tungsten Target Rare Earth Smelting Titanium Tungsten Sputtering Target
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xProduct Details
| Name | Tungsten Sputtering Targets | Shape | Round |
|---|---|---|---|
| Material | W Tungsten | Chemical Composition | 99.95% Min. |
| Surface Condition | Lathed, Ground,polishing Or Mirror Polishing | Application | Aerospace, Rare Earth Smelting |
| High Light | W Tungsten Target,W Titanium Tungsten Sputtering Target,Rare Earth Smelting Tungsten Target |
||
Product Description
W Tungsten Sputtering Targets Aerospace, Rare Earth Smelting
Tungsten Sputtering Targets widely used in Aerospace, rare earth smelting, electric light source, chemical equipment, medical equipment, metallurgical machinery, smelting equipment, petroleum, etc
PARAMETER
|
OD(mm) |
ID(mm) |
Length(mm) |
Custom Made |
|
140-300 |
120-280 |
100-3300 |
|
Model Number |
W1 |
|||
|
Shape |
customized |
|||
|
Chemical Composition |
99.95% W |
|||
Feature
(1) Smooth surface without pore,sporesch and o,ther imperfimperfectionsrinding or lathing edge, no cutting marks
(3) Unbeatable lerel levelterial purity
(4) High ductility
(5) Homogeneous micro microtrucaltureaser marking for your special Item with name, brand, purity size, and so on
(7)Every pcs of sputtering targets from the powder materials number, mixing workers, outgas and HIP time, machining person, and packing details are all made ourselves.
Specification
|
Atomic number |
74 |
|
CAS number |
7440-33-7 |
|
Atomic mass |
183.84 [g/mol] |
|
Melting point |
3420 °C |
|
Boiling point |
5555 °C |
|
Density at 20 °C |
19.25 [g/cm3] |
|
Crystal structure |
Body-centered cubic |
|
Coefficient of linear thermal expansion at 20 °C |
4.410-6[m/(mK)] |
|
Thermal conductivity at 20 °C |
164 [W/(mK)] |
|
Specific heat at 20 °C |
0.13 [J/(gK)] |
|
Electrical conductivity at 20 °C |
18.2106[S/m] |
|
Specific electrical resistance at 20 °C |
0.055 [(mm2)/m] |
APPLICATIONS
semiconductor
chemical vapor deposition (CVD)
physical vapor deposition (PVD) display
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