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Wear Resistant Tungsten Targets Sputtering Length 100mm High Thermal Conductivity

Model Number Tungsten Sputtering Target
Minimum Order Quantity Negotiate
Price Negitionable
Packaging Details Standard export cartons
Delivery Time 30 days after receiving down payment
Payment Terms L/C, D/A, D/P, T/T
Supply Ability 10000sets/month

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Product Details
Name Tungsten Sputtering Target Shape Round
Material Tungsten Chemical Composition W 99.95% Min.
Surface Condition Lathed, Ground,polishing Or Mirror Polishing Application Wear Resistant And Corrosion Resistant Thin Film Coating
High Light

Wear Resistant Tungsten Targets

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Wear Resistant Tungsten Sputtering Targets

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100mm Wear Resistant Tungsten Sputtering Targets

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Product Description

Tungsten Rotatable Sputtering Target

 

Tungsten targets are mainly used in aerospace, rare earth smelting, electrical light sources, chemical equipment, medical equipment, metallurgical machinery, smelting equipment and petroleum etc..

 

PARAMETER

 

OD(mm)

ID(mm)

Length(mm)

Custom Made

140-300

120-280

100-3300

 

 

Model Number

W1

Shape

customized

Chemical Composition

99.95% W

 

Feature

 

1. High density
2. High wear-resistant
3. High thermal conductivity with low thermal expansion coefficient
4. High vibration-damping capacity and high Young’s modulus
5. High oxidation resistance and corrosion resistance

 

Specification

 

Atomic number

74

CAS number

7440-33-7

Atomic mass

183.84 [g/mol]

Melting point

3420 °C

Boiling point

5555 °C

Density at 20 °C

19.25 [g/cm3]

Crystal structure

Body-centered cubic

Coefficient of linear thermal expansion at 20 °C

4.410-6[m/(mK)]

Thermal conductivity at 20 °C

164 [W/(mK)]

Specific heat at 20 °C

0.13 [J/(gK)]

Electrical conductivity at 20 °C

18.2106[S/m]

Specific electrical resistance at 20 °C

0.055 [(mm2)/m]

 

APPLICATIONS

 

semiconductor

chemical vapor deposition (CVD)

physical vapor deposition (PVD) display